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RTP-150RL Rapid Thermal Annealing System with Three Sets Process Gases
RTP-150RL:
Is in the protection atmosphere of the desktop manual rapid annealing system, with infrared visible light heating single piece Wafer or sample, short process time, high temperature control precision, suitable for 2-6 inch wafer.Its unique cavity design, advanced temperature control technology and a unique RL900 software control system over conventional diffusion furnace annealing systems ensures excellent thermal uniformity compared with other RTP systems.
Product characteristics:
1. Infrared halogen lamp tube heating, cooling using air cooling.
2. Tube power PID temperature control, can accurately control the temperature heating, to ensure good reproducibility and temperature uniformity.
3. Parallel air intake method is adopted, and the inlet of gas is set on the Wafer surface to avoid cold points during the annealing process and ensure good temperature uniformity of the product.
4. Air and vacuum treatment methods can be selected, before the intake air gas purification treatment.
5. Standard with three sets of process gases.
6. The maximum size of a measurable single wafer sample is 6 inches (150mm).
7. The triple safety measures of furnace safety temperature opening protection, temperature controller opening authority protection and equipment emergency stop safety protection are adopted to ensure the safety of instruments.